•Cryogenically pumped to high vacuum, capable of low10E-8 Torr
•Six DC/RF magnetron sputter guns
•Computer-controlled substrate ring holds ten different substrates whose temperatures can be varied from 77 K to 1000 K
•Laser Ablation •In-situ SMOKE
VACUUM INDUCTION FURNACE
•Can be easily upgraded to include arc melting, resistive heating and casting, melt-spinning capabilities with a minimum cost.
Potentiostat / Galvanostat
Computer-controlled Potentiostat/Galvanostat 100 V compliance, 2 A current output
•Potentiostatic •Potentiodynamic •Cyclic Voltammogram •Potential Square-Wave •Potential Stair-Step •Potential Scan/Hold •Polarization Resistance •Square-Wave Voltammetry •Galvanostatic •Galvanodynamic •Galvanic Square-Wave •Galvanic Cycle •E&I Noise
Four furnaces offer temperatures as high as 1200 C, with a choice of ambient gases.
THIN FILM X-RAY DIFFRACTOMETER
This measurement system consists of Philips 3100 X-ray generator, Philips PW1821 multi-purpose Sample stage, thin film system and also X'Pert control and analysis software. Apart from the usual applications like phase determination, thin film thickness analysis, it can also be used for stress analysis and texture analysis.
VIBRATING SAMPLE MAGNETOMETERS (VSM)
Our magnetic characterization facilities include two Lakeshore Vibrating Sample Magnetometers (VSM) with low (2.2Tesla) and high field (9 tesla) measuring capability at temperatures between 4 and about 1000K. The electromagnet VSM goes to a field of 14kOe and has an oven capable of reaching 1000°C. Our superconducting magnet goes to a field of 9 tesla and measures to below 4.2K.
HIGH FREQUENCY ELECTROMAGNETIC RESPONSE MEASUREMENTS
Agilent Technologies High Frequency Network Analyser with S-parameter Test Set and High Power Option.The built-in S-parameter test set provides a full range of magnitude and phase measurements in both the forward and reverse directions. Built-in vector accuracy enhancement techniques include full two-port, adapter-removal, and optional TRL calibration.
50 MHz to 40 GHz 100 dB of dynamic range